Surface analysis (UHV, MOKE, Ellipsometry)
Complex UHV system for in-situ preparation a characterization of surfaces, interfaces and nanostructures is situated in laboraties of our group. The systems incorporates several analytical and preparation techniques: room temperature scanning tunneling/atomic force microscopy (STM/AFM, to be instaled in 2014), X-ray photoelectron spectroscopy (XPS), secondary ion mass spectroscopy, low energy ion scattering spectroscopy, low- and reflected-high-energy electron diffraction and thermal desorption spectroscopy, and deposition by thermal evaporation and ion beams.
For ex-situ analyses microreflection spectrometer, a setup for magnetooptical Kerr effect in a microscopic mode and UV-Vis ellipsometer are avaible.