2019 - Atomic source designed for UHV SEM
Atomic source suitable for defined deposition of material on the substrate (deposition rate about 10 nm per hour). The atomic source consists of a Mo cup, which is heated by the accelerated electrons from the tungsten filament. The atomic source is actively water cooled and its temperature is monitored by thermocouples available on the chilled source body. The source is equipped by a deceleration electrode that suppresses the effect of parasitic ions emerging from the sources. Remote shutter can be set to three precisely defined positions (Off, On, aperture of 1 mm in diameter).
